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ACP120 series General purpose dry pumps for Industrial and R&D applications.

ACP120 series
General purpose dry pumps for Industrial and R&D applications.
The right choice for a wide range of applications :

Successfully installed worlwide in the Semiconductor industry for over ten years, the Alcatel multi-roots technology is now available for other market segments.
ACP120 series pumps offer an attractive combination of pumping speed and ultimate pressure for many R&D and industrial applications.
- Ultimate pressure : 10-2 mbar range
- Peak pumping speed : 95 m3/h (66 cfm)

ACP120 series pumps will bring benefit of clean and dry vacuum whenever particulate or oil contamination is an vacuum whenever particulate or oil contamination is prohibited.
ACP120 pumps will provide many other advantages :

- Environmentally friendly
- Low power cosumption
- Continuous inlet pressure up to 300 mbar
- Up to 10 m3 volume evacuation
- Resistant to harsh cycling

ACP120 standard version is designed for non-corrosive applications.
ACP120 G version is suitable for pumping traces of corrosive gases or condensable vapours.

Typical applications :

- Glass coating
- Other coaters
- General R&D applications
- Metallurgy
- Drying processes
- Cylinder evacuation
- Foreline pumping of Roots blowers
- Freeze drying

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