Airborne Molecular Contamination Detection Method for decontamination

Photomask decontamination

While photomask prices continue to increase and their lifetime continues to be shortened due to molecular contamination, it is a key issue to understand the chemical mechanism of the mask damage caused by haze problem to save fabrication cost.  We show a unique method for in-situ Airborne Molecular Contamination, or AMC, measurement in the mask carrier mini-environment as well as the small volume confined under the pellicle protective film. 

Additionally, an ultimate solution to decontaminate the photomask and surrounding environment with a vacuum purging system shows preliminary positive results on the extension of photomask life time by elimination of the haze problem cause.

Dokumentation :

Download now See the Photomask article Ladda hem

Överst på sidan

Kontakta oss Företaget Nyheter Event Site map Nyhetsbrev  

Välj hemsida :

Adixen Worldwide | Adixen China | Adixen Germany | Adixen France | Adixen India | Adixen Italy | Adixen Japan
Adixen Korea | Adixen Netherlands | Adixen Taiwan | Adixen UK | Adixen USA | Adixen Singapore
Copyright © 2010 Alcatel Vacuum Technology. All right reserved Legal Notices